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Vacuum Plasma Spray Process
2024-05-17

Plasma Spray Process,is a relatively new technique,involves spraying semi-molten material onto a substrate surface to provide a functional coating.

 

Control of the chamber atmosphere during the process facilitates a reduction in the amount of impurities and contaminants, and results in higher-quality deposits. Because of the high energy density of the thermal plasma, materials with very high melting points, such as refractory metals and ceramics, can be deposited by this technique。

By suitably manipulating the mandrel during the spray process, complex shapes can be built up. The molten particles hit the target surface and rapidly cool to form a stable structure. After the deposit solidifies, the mandrel can be removed and the process is complete (Fig. 2). VPSF is also capable of producing multi-layered, functionally graded structures and composite materials by spraying different materials with separate nozzles.

Lucky Precision Material Co., Ltd is a professional sputtering targets manufacturer, whose vacuum spraying target keeps leading in top standard with Soleras, with advanced vacuum plasma spraying process.

 

Advantages of vacuum spraying targets:

· High Purity

· High Density

· Low Oxygen

· Longer Service 

· Better Stability

· Competitive Price

Our targets including Si, SiAl, Ni, Cr, NiCr, Sn, In, InSn, ZnAl, Tiox, NbOx, ZrOx ect, widely used Low-E glass coating, optical coating, flexible electronics coating, photovoltaics coating.

 

If you have any interests, please reach me out at

grace-gu@nuoqitarget.com

 

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